发明名称 CRACK DETECTION METHOD FOR SILICON WAFER
摘要 <p><P>PROBLEM TO BE SOLVED: To accurately detect the presence and a size of a crack in a silicon wafer. <P>SOLUTION: An impact is applied onto the silicon wafer 1 to generate vibration, a vibration frequency thereof is converted into an electric signal via a microphone, and an integrated value of power spectra of the vibration frequency is calculated to be compared with an integrated value of power spectra of a vibration frequency preliminarily found. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004028859(A) 申请公布日期 2004.01.29
申请号 JP20020187383 申请日期 2002.06.27
申请人 KYOCERA CORP 发明人 TAGUCHI TETSUYA
分类号 G01N29/12;H01L31/04;(IPC1-7):G01N29/12 主分类号 G01N29/12
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