| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrostatic attracting device which can generate an effective attraction force to a region to be processed such as a device pattern or the like on a substrate without imparting an influence, and to provide a vacuum treating device using the same. SOLUTION: An electrostatic chucking plate 5 of an electrostatic chuck is divided into a device region 51 corresponding to a device pattern of the substrate 10, and a non-device region 52 corresponding to a region on which the device pattern 12 of the substrate 10 is not formed. Coarse and dense structures of attracting electrodes 6, 7 of the device region 51 and the non-device region 52 of the chuck plate 5 are different, and thus an electric field gradient in the device region 51 is constituted to be smaller than that of the non-device region 52. COPYRIGHT: (C)2004,JPO |
