| 摘要 |
PROBLEM TO BE SOLVED: To adjust projection magnification while employing a constitution such that the optical axis of an imaging lens is set parallel to a mask surface and a projected surface and luminous flux which travels forward and backward in the imaging lens is guided to the projected surface by using a mirror. SOLUTION: A projection exposure optical system 10 projects light emitted by an illumination optical system 1 to expose a plate 3 to a pattern of the mask 2 almost with nonmagnification and has 1st and 2nd condenser lenses 11 and 15 having a common optical axis nearly perpendicular to the mask 2 and plate 3 and an imaging lens 13 having an optical axis perpendicular thereto; and the luminous flux from the mask 2 is made incident on the imaging lens 13 by a 1st mirror 12a, reflected by a 2nd mirror 14, passed through the imaging lens 13, and then reflected by the 3rd mirror 12b to be made incident on the 2nd condenser lens 15. The 2nd condenser lens 15 is movable along the optical axis A×1 for magnification adjustment. COPYRIGHT: (C)2004,JPO
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