发明名称 PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which is useful for the recording layer of a negative lithography original plate for recording patterns with an infrared laser and with which an image with superior dot reproducibility can be formed. <P>SOLUTION: The photosensitive composition contains a compound which is cured by exposure to infrared radiation. When the photosensitive composition is exposed to the infrared laser after being formed into a film, the electrostatic capacity of an exposed part increases at a rate &le;0.7 times that of an unexposed part. The increase rate of electrostatic capacity is measured by using a model liquid of an alkali aqueous solution having a pH selected according to an acid radical that a polymer in the composition has. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004029116(A) 申请公布日期 2004.01.29
申请号 JP20020181417 申请日期 2002.06.21
申请人 FUJI PHOTO FILM CO LTD 发明人 YANAKA HIROMITSU
分类号 G03F7/004;G03F7/00;G03F7/26 主分类号 G03F7/004
代理机构 代理人
主权项
地址