| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrostatic attracting device which can generate an effective attraction force to a region to be processed such as a device pattern or the like on a substrate without imparting an influence, and to provide a vacuum treating device using the same. SOLUTION: An electrostatic chuck plate 5 of an electrostatic chuck 4 includes a plurality of attracting electrodes 6, 7 provided in a dielectric. A plurality of attracting electrodes 6, 7 are provided in a dielectric. The electrodes 6, 7 have a pair of wide electrodes 61, 71 having substantially identical areas. The wide electrodes 61, 71 of the attracting electrodes 6, 7 have an areal ratio of 4:6 to 6:4. Widths of the electrodes 61, 71 are preferably 2 mm or more. An interval of the wide electrodes 61, 71 is preferably larger than 1 mm. COPYRIGHT: (C)2004,JPO |
