| 发明名称 |
POLISHING COMPOSITION CONTAINING CONDUCTING POLYMER |
| 摘要 |
<p>The invention provides a polishing system comprising (a) an abrasive, a polishing pad, a means for oxidizing a substrate, or any combination thereof, (b) a conducting polymer having an electrical conductivity of 10<-10> S/cm to 10<-6> S/cm, and (c) a liquid carrier.</p> |
| 申请公布号 |
WO2004009719(A1) |
申请公布日期 |
2004.01.29 |
| 申请号 |
WO2003IB02880 |
申请日期 |
2003.06.25 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
CHERIAN, ISAAC, K.;ZHANG, JIANG;SUN, FRED, F.;WANG, SHUMIN;KLINGENBERG, ERIC, H. |
| 分类号 |
H01L21/321;H01L21/3213;(IPC1-7):C09G1/02 |
主分类号 |
H01L21/321 |
| 代理机构 |
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