| 摘要 |
<P>PROBLEM TO BE SOLVED: To switch a plurality of ion species while maintaining a vacuum condition of a chamber 1 in a plasma sputter type negative ion source. <P>SOLUTION: In this plasma sputter type negative ion source generating plasma 13 inside the hermetic chamber 1, sputtering a sputter target 6 by the plasma 13, and emitting ions of a target atom, multiple kinds of sputter targets 6 including a predetermined target element are arranged inside the hermetic chamber 1, and positive ions inside the plasma 13 are guided to one target selected from multiple kinds of sputter targets 6. The positive ion is guided to the target when moved to the vicinity of one sputter target aimed at a drop electrode 10, to which negative voltage is applied, or a hole part in a partition plate 11 having the hole in the center. <P>COPYRIGHT: (C)2004,JPO |
