发明名称 METHOD FOR VERIFYING PROXIMITY EFFECT CORRECTION OF MODEL BASE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for verifying a proximity effect correction method for a model base which makes it possible to detect an error inherent in a model or algorithm. <P>SOLUTION: A test pattern is generated in a step S1. In S2, transfer to the test pattern is simulated by using a model used for the proximity effect correction method for the model base. In S3, a table of proximity effect correction values when a proximity effect correction method for a rule base is applied is generated based upon the transfer simulation result. In S4, a 2nd correction pattern is generated by using the table of proximity effect correction values. In S5, the 1st correction pattern and 2nd correction pattern are compared with each other. In S6, it is judged that the model and algorithm of the proximity effect correction method for the model base have no error when the pattern separation quantity of a line part of the 2nd correction pattern which corresponds to a line part of the 1st correction pattern is smaller than a permissible deviation value and have errors when larger. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004029193(A) 申请公布日期 2004.01.29
申请号 JP20020182639 申请日期 2002.06.24
申请人 SONY CORP 发明人 OGAWA KAZUHISA;KAWAHARA KAZUYOSHI;ONUMA EIJU
分类号 G03F1/36;G03F1/68;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/36
代理机构 代理人
主权项
地址