发明名称 |
Semiconductor device and manufacturing method of the same |
摘要 |
A variable capacitor includes an N<+> layer including a variable capacitance region, a P<+> layer epitaxially grown on the N<+> layer and formed from a SiGe film and a Si film, and a P-type electrode. An NPN-HBT (Hetero-junction Bipolar Transistor) includes a collector diffusion layer formed simultaneously with the N<+> layer of the variable capacitor, a collector layer, and a Si/SiGe layer epitaxially grown simultaneously with the P<+> layer of the variable capacitor. Since a depletion layer formed in a PN junction of the variable capacitor can extend entirely across the N<+> layer, reduction in variation range of the capacitance can be suppressed.
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申请公布号 |
US2004018692(A1) |
申请公布日期 |
2004.01.29 |
申请号 |
US20030620613 |
申请日期 |
2003.07.17 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
OHNISHI TERUHITO;TAKAGI TAKESHI;ASAI AKIRA;FUJII TAIZO;SUGIURA MITSUO;MINAMI YOSHIHISA |
分类号 |
H01L27/06;H01L27/08;H01L29/93;(IPC1-7):H01L21/20 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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