发明名称 FABRICATION OF OPTICAL COMPONENTS USING SI, SIGE, SIGEC, AND CHEMICAL ENDPOINT DETECTION
摘要 One embodiment of the present invention provides a system to facilitate using selective etching to form optical components on a circuit device. The system operates by receiving a substrate composed of a first material including a buffer layer composed of a second material. The system forms a sacrificial layer composed of a third material on the buffer layer. Next, the system forms an optical fiber core composed of a fourth material on the sacrificial layer. After the optical fiber core has been formed, the system performs an etching operation using a selective etchant to remove the sacrificial layer. The system also applies a cladding layer to the optical fiber core.
申请公布号 WO2004010166(A2) 申请公布日期 2004.01.29
申请号 WO2003US14125 申请日期 2003.05.01
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 PETERSON, JEFFREY;HUNT, CHARLES
分类号 G02B6/12;G02B6/136 主分类号 G02B6/12
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