METHOD FOR THE PRODUCTION OF PHOTORESIST STRUCTURES

摘要

The invention relates to a method for producing a large variety of photoresist structures, according to which a volume of photosensitive material (5) is exposed at least once by means of at least two light beams (1, 2) which overlap within the volume of photosensitive material (5) and is then subjected to a development process, the light beams (1, 2) penetrating at least one transparent optical element (3). Said optical element (3) is embodied as a polyhedron which has planar or curved surfaces and largely prevents the light beams from refracting on the surface of the volume of photosensitive material (5) such that the angle of refraction of the light beams (1, 2) can be greater in the volume of photosensitive material (5) than the critical angle of the total reflection, which has a limiting effect without the optical element (3).