发明名称 |
CMP PROCESS INVOLVING FREQUENCY ANALYSIS-BASED MONITORING |
摘要 |
The invention provides a method for monitoring a chemical-mechanical polishing process, comprising receiving a real-time data signal from a chemical-mechanical polishing process, wherein the real-time data signal pertains to a frictional force, torque, or motor current, converting the data signal into a power spectrum of signals with different frequencies whose sum equals that of the original data signal, identifying and monitoring the signal components of the power spectrum corresponding to an aspect of the chemical-mechanical polishing process, detecting a change in the amplitude or frequency of the signal component, and altering the chemical-mechanical polishing process in response to the detected change. The invention also provides an apparatus for carrying out the aforementioned method. |
申请公布号 |
WO03019627(A3) |
申请公布日期 |
2004.01.29 |
申请号 |
WO2002US26328 |
申请日期 |
2002.08.19 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
CARTER, PHILLIP, W.;CHAMBERLAIN, JEFFREY, P. |
分类号 |
B24B49/16;B24B37/013;B24B49/04;B24B49/12;H01L21/304 |
主分类号 |
B24B49/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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