发明名称 |
CATADIOPTRIC MULTI-MIRROR SYSTEMS FOR PROTECTION LITHOGRAPHY |
摘要 |
<p>According to one exemplary embodiment, a photolithographic reduction projection catadioptric objective is provided and includes a first optical group (G1) and a second substantially refractive optical group (G2) more image forward than the first optical group (G1). The second optical group (G2) includes a number of lens elements (E4-E 16) and has a negative overall magnifying power for providing image reduction. The first optical group (G1) has a folded geometry for producing a virtual image and the second optical group (G2) receives and reduces the virtual image to form an image with a numerical aperture of at least substantially (0.80).</p> |
申请公布号 |
WO2004010200(A1) |
申请公布日期 |
2004.01.29 |
申请号 |
WO2002US22766 |
申请日期 |
2002.07.17 |
申请人 |
CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG;HUDYMA, RUSSELL;ULRICH, WILHELM |
发明人 |
HUDYMA, RUSSELL;ULRICH, WILHELM |
分类号 |
G02B13/14;G02B13/18;G02B13/24;G02B17/08;G03F7/20;H01L21/027;(IPC1-7):G02B17/08 |
主分类号 |
G02B13/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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