发明名称 ELECTRON BEAM IRRADIATION EQUIPMENT AND SCANNING ELECTRON MICROSCOPE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an electron microscope apparatus capable of observing a large size sample without cutting by improving inconvenience caused by a small sample chamber of a conventional electron microscope apparatus. SOLUTION: An electron beam irradiation angle to a sample and a detection angle are made variable by setting a mirror cylinder and a detector on a container on a semicircular ball with a small electron beam generator.By observing the sample in a state that the container is put on the large size sample, observation from the different angle is made possible. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004031207(A) 申请公布日期 2004.01.29
申请号 JP20020187840 申请日期 2002.06.27
申请人 CANON INC 发明人 UENO RIE;OTSUKA MITSURU
分类号 H01J37/28;H01J37/16;H01J37/18;(IPC1-7):H01J37/28 主分类号 H01J37/28
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