发明名称 Silica layers and antireflection film using same
摘要 A silica layer is provided which is usable as a low refractive index undergoing no change in its refractive index. Further, a silica layer is provided which is highly productive and usable as a medium or high refractive index layer undergoing neither reduction in transmittance nor change in spectral colors. Still further, an antireflection film using these silica layers is provided. These silica layers are: a silica layer composed of an organic silicon compound, which has a refractive index of not less than 1.40 and not more than 1.46 (lambda=550 nm), and whose composition is represented by SiOxCy: H (x=1.6 to 1.9, y=0.2 to 1.0); a carbon-containing silica layer, which has a, refractive index of not less than 1.55 and less than 1.80 (lambda=550 nm), and whose composition is represented by SioaCb (a=0.7 to 1.7, b=0.2 to 1.4) ; and a silica layer containing carbon, which has a refractive index of not less than 1.80 and not more than 2.50 (lambda=550 nm), and whose composition is represented by SiOdCe (d=0.5 to 0.9, e=1.0 to 2.0). These silica layers are used to form the antireflection film.
申请公布号 US2004018362(A1) 申请公布日期 2004.01.29
申请号 US20030623786 申请日期 2003.07.21
申请人 NAKAJIMA TATSUJI;ICHIMURA KOJI 发明人 NAKAJIMA TATSUJI;ICHIMURA KOJI
分类号 C23C16/30;C23C16/40;C23C28/04;C23C30/00;G02B1/11;(IPC1-7):B32B17/06 主分类号 C23C16/30
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