DEPOSITION APPARATUS AND DEPOSITION METHOD

摘要

PURPOSE: A deposition apparatus and a deposition method are provided to form uniformly a depositing layer and enhance a depositing ratio by using only one depositing source. CONSTITUTION: A deposition apparatus includes a substrate holder, a discharging portion(20), a depositing source(10), and a connector(30). The substrate holder is used for supporting a substrate. The discharging portion(20) includes a discharging side(21) and a case. Two or more discharging holes(22) are formed on the discharging side(21). The case has a path to connect the discharging holes(22). The depositing source(10) is used for evaporating the depositing material. The connector(30) is used for connecting the depositing source(10) to the discharging portion(20).