METHOD FOR FORMING CONTACT

摘要

PURPOSE: A method for forming a contact is provided to prevent the generation of bridges in a process for forming a conductive plug by using a line-shaped contact instead of a hole-shaped contact. CONSTITUTION: A bit line(205) is formed on a semiconductor substrate(200). An insulating spacer(206) is formed on a side of the bit line(205). A photoresist pattern is formed on the entire surface of the resultant structure. A line-shaped contact is formed by performing an etch process using the photoresist pattern. The photoresist pattern is removed. A conductive layer is formed on the entire surface of the semiconductor substrate(200). A conductive plug(220) is formed by performing a CMP process for the conductive layer.