发明名称 |
Synthetic quartz glass blank |
摘要 |
<p>A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950 DEG C each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1x10<-6>. The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.</p> |
申请公布号 |
EP1319637(A3) |
申请公布日期 |
2004.01.28 |
申请号 |
EP20020258524 |
申请日期 |
2002.12.11 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD.;SHIN-ETSU QUARTZ PRODUCTS CO., LTD. |
发明人 |
OTSUKA, HISATOSHI;SHIROTA, KAZUO;FUJINOKI, AKIRA;NISHIMURA, HIROYUKI;SHIMAKAWA, TAKAYUKI |
分类号 |
C03B19/14;C03C3/06;(IPC1-7):C03C3/06;C03C4/00 |
主分类号 |
C03B19/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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