发明名称 Illumination system for a deep ultraviolet microscope
摘要 A lighting device for a DUV microscope (1) has a lighting beam path (6) going out from a DUV light source (5) in which a collector (7) and a reflection filter system (9) are located. The latter generates a DUV wavelength band and consists of four reflection filters (8) at which the lighting beam path is reflected at the same angle of reflection alpha. In front of and behind the reflection filter system, the lighting beam path runs coaxially. The angle of reflection alpha is no greater than 30 degrees. The DUV wavelength band, lambda plus delta lambda, has a half value width of 20 nano-meters maximum and a peak with a crest value of over 90% of the radiated light intensity.
申请公布号 EP1069449(A3) 申请公布日期 2004.01.28
申请号 EP20000111442 申请日期 2000.05.27
申请人 LEICA MICROSYSTEMS WETZLAR GMBH 发明人 DANNER, LAMBERT;VOLLRATH, WOLFGANG;EISENKRAEMER, FRANK;OSTERFELD, MARTIN;VEITH, MICHAEL
分类号 G02B5/26;G02B5/28;G02B21/06;G02B21/16 主分类号 G02B5/26
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