发明名称 DIFFERENTIAL PHOTOCHEMICAL & PHOTOMECHANICAL PROCESSING
摘要 <p>The present invention relates to the process of selectively exposing matter to a specific wavelength of electromagnetic energy in sufficient flux density per wavelength to cause or promote a desired effect. The process includes, but is not limited to, destroying, disinfecting, denaturing, disinfesting, disrupting, or dehydration of one or more of the substances present. More specifically, present invention relates to subjecting matter, which may contain a mixture of substances, to electromagnetic energy, in concurrence with its spectral properties to exploit the spectral differences within the substance or within a mixture of substances. Energies are applied to cause wavelength-dependent reactions resulting from differential absorption; this additional applied energy manifests itself in changes, or quantum transitions, in the vibrational, rotational, magnetic, and electronic states of the molecules. Generally, the process utilizes wavelengths from about one light second to about ten electron volts, or wavelengths with energy levels less than that of ionization.</p>
申请公布号 EP1384235(A1) 申请公布日期 2004.01.28
申请号 EP20020731622 申请日期 2002.05.03
申请人 ADVANCED LIGHT TECHNOLOGY, LLC. 发明人 PIERCE, BRIAN
分类号 G01N33/483;A23L3/26;A61L2/00;A61L2/08;G01N21/27;G01N21/33;G01N21/35;G21K5/00;(IPC1-7):G21K5/00 主分类号 G01N33/483
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