发明名称 Insulated gate bipolar semiconductor device transistor with a ladder shaped emitter
摘要 A semiconductor device capable of lowering the ON voltage by decreasing the area of the invalid region compared to that of prior art yet maintaining the ability for suppressing the latch-up comparable to that of the conventional IGBTS. The semiconductor device comprises a semiconductor layer of a first conductivity type, a collector layer of a second conductivity type formed on one surface of the semiconductor layer, a base layer of the second conductivity type formed on the other surface of the semiconductor layer, and an emitter layer of the first conductivity type formed in the base layer, wherein the emitter layer having the shape of a ladder being constituted by two crossbeams and cleats formed between the crossbeams, the cleat being provided even between facing end portions of the two crossbeams.
申请公布号 US6683348(B1) 申请公布日期 2004.01.27
申请号 US20020030943 申请日期 2002.04.30
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 HARUGUCHI HIDEKI;TOMOMATSU YOSHIFUMI
分类号 H01L29/06;H01L29/739;(IPC1-7):H01L29/76 主分类号 H01L29/06
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