Fluorine-containing monomeric ester compound for base resin in photoresist composition

摘要

The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formulain which R<1 >is preferably a hydrogen atom or methyl group, R<2 >is preferably a trifluoromethyl group, R<3 >is a non-aromatic polycyclic hydrocarbon group or, preferably, an adamantyl group and R<4 >is preferably a hydrogen atom or methyl group. This unsaturated ester compound is polymerizable to give a (co)polymeric resin which can be used as a base resinous ingredient in a photoresist composition for light exposure with ultraviolet light of a very short wavelength by virtue of the high transparency to the short-wavelength light. A synthetic method for the preparation of the novel ester compound is disclosed.