发明名称 Method of forming capacitor constructions
摘要 The invention includes a method of treating a predominantly inorganic dielectric material on a semiconductor wafer. A laser is utilized to generate activated oxygen species. Such activated oxygen species react with a component of the dielectric material to increase an oxygen content of the dielectric material. The invention also includes a method of forming a capacitor construction. A first capacitor electrode is formed to be supported by a semiconductor substrate. A dielectric material is formed over the first capacitor electrode. A precursor is provided at a location proximate the dielectric material, and a laser beam is focused at such location. The laser beam generates an activated oxygen species from the precursor. The activated oxygen species contacts the dielectric material. Subsequently, a second capacitor electrode is formed over the dielectric material.
申请公布号 US6683005(B2) 申请公布日期 2004.01.27
申请号 US20030347043 申请日期 2003.01.17
申请人 MICRON TECHNOLOGY, INC. 发明人 SANDHU GURTEJ S.;DOAN TRUNG TRI
分类号 H01L21/02;H01L21/268;H01L21/3105;H01L21/314;H01L21/316;(IPC1-7):H01L21/302;H01L21/462 主分类号 H01L21/02
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