发明名称 Substrate processing method
摘要 In processing a substrate, adsorption members provided on a table play an important role in whether "indirectly influenced marks" are left on the rear surface of the substrate. Groups of adsorption members are selected in a predetermined order for use in the adsorption operation. Adsorption at a first group of members is terminated before an "indirectly influenced mark" is left on the substrate, and another adsorption operation is initiated at a second group of members. In this manner, the substrate is held on the table by migrating adsorption sites on the rear surface of the substrate.
申请公布号 US6682777(B2) 申请公布日期 2004.01.27
申请号 US20010940612 申请日期 2001.08.29
申请人 TOKYO ELECTRON LIMITED 发明人 OMORI TSUTAE
分类号 B05C11/08;B05D1/00;H01L21/00;H01L21/683;(IPC1-7):B05D1/02;B05D3/12 主分类号 B05C11/08
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