POLISHING SOLUTION SUPPLY APPARATUS

摘要

PURPOSE: A polishing solution supply apparatus is provided to be capable of securing the uniformity of a CMP(Chemical Mechanical Polishing) process and improving the quality of a semiconductor product by automatically controlling the supply of the polishing solution. CONSTITUTION: A polishing solution supply apparatus is provided with a sensor(22) for detecting the flow of a polishing solution and a feedback system(27). The feedback system includes a converter(24) for transforming the signal generated from the sensor into a corresponding voltage, a PID controller(25) for carrying out a compensating process using a PID constant after comparing the voltage supplied from the converter with a reference value, and a motor driving part(26) for receiving a control signal of the PID controller. The polishing solution supply apparatus further includes a pump(21) for controlling the flow of the polishing solution according to the motor driving part.