SILICA-BASED ORGANIC FILM, METHOD OF MANUFACTURING THE SAME, AND BASE MATERIAL COMPRISING ORGANIC FILM

摘要

PURPOSE: A silica-based organic film, a method of manufacturing the same, and a base material comprising an organic film are provided to reduce an etching rate by using hydrofluoric acid in the silica-based organic film. CONSTITUTION: A coating solution containing a reaction product which is obtained by hydrolyzing at least one first alkoxysilane compound selected from the group consisting of compounds represented by the first general formula and compounds represented by the second general formula in an organic solvent in the presence of an acid catalyst is applied on a target material(15) to form a coating film. The coating film is baked in an atmosphere having an oxygen concentration of 1000 ppm or less to form a silica-based organic film(5).