| 摘要 |
PURPOSE: A multipurpose holder for particle inspection apparatus and an inspecting method using the same are provided to reduce an inspecting period and enhance the productivity by inspecting a wafer and a photo mask. CONSTITUTION: A multipurpose holder for particle inspection apparatus includes a multipurpose holder(30), a holder chuck(70), a vacuum unit(80), a stage, and a CCD camera(10). A wafer and a photo mask are selectively loaded on the multipurpose holder(30). A chrome pattern is formed on an upper surface of the multipurpose holder. The holder chuck(70) is used for supporting a bottom of the multipurpose holder. The vacuum unit(80) includes a vacuum tube path(82) to support and absorb the holder chuck. The stage is used for supporting a bottom of the vacuum unit. The CCD camera(10) is used for receiving the light reflected from a defect part and analyzing the received light.
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