| 摘要 |
PURPOSE: To prevent the contamination by ion attack of plasma to a diaphragm by which an antenna is arranged on the atmosphere side, in a plasma processing apparatus. CONSTITUTION: The diaphragm 7 for separating the induction antenna 5 and a vacuum treatment chamber 1 consists of a non-magnetic metal plate 71 and a dielectric 72, with the non-magnetic metal plate 71 dominating a larger area than the dielectric 72. The dielectric 72 is formed linearly so as to cross at right angles with the induction antenna 5, to prevent the occurrence of an eddy current induced by the metal plate 71. The vacuum treatment chamber is equipped with a plasma ignition means 9 for stable plasma ignition.
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