发明名称 APPARATUS AND METHOD FOR FORMING ORGANIC FILM
摘要 PROBLEM TO BE SOLVED: To supply an organic material being set to be a vapor-phase state onto the entire surface of a substrate whose position is fixed. SOLUTION: The organic material 12 is vaporized or sublimated in a vaporization sublimation chamber 5 to generate a feed gas. A carrier gas is mixed into the feed gas and is transported to a film formation chamber 4 by a feed gas transportation pipe 6. A direction control plate 2 is provided at an injector 18 in the feed gas transportation pipe 6. The direction control plate 2 changes the flow of the feed gas toward the substrate 3 along the surface of the substrate 3, and forms a film by supplying the feed gas to the entire surface of the substrate 3, thus making uniform a film thickness distribution within the substrate 3 and forming an improved organic film. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004022400(A) 申请公布日期 2004.01.22
申请号 JP20020177194 申请日期 2002.06.18
申请人 SONY CORP 发明人 MEMESAWA SATOHIKO;NARUI HIRONOBU;YANASHIMA KATSUNORI;SASAKI KOJI
分类号 H05B33/10;C23C14/12;H01L51/50;H05B33/14;(IPC1-7):H05B33/10 主分类号 H05B33/10
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