PATTERNED SUBSTRATES

摘要

A method is provided for the deposition and patterning of an organosilane on a substrate, which comprises the steps of : (i) forming a self-assembled monolayer of said organosilane on said substrate by depositing said organosilane on said substrate using compressed carbon dioxide as the solvent for said organosilane; and (ii) patterning the organosilane self-assembled monolayer thus formed using a patterning technique that does not use a solvent to give the desired pattern. A process for the patterned etching of a substrate comprising treating with an etchant a substrate patterned with an organosilane self-assembled monolayer produced according to said method of patterened deposition is also provided, as is an electronic, optical or electro-optical device comprising a layer of an etched substrate produced according to said process.