| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To accurately analyze a sample by accurately obtaining a slit function adapted to the optical system, in an analysis method using the slit function. <P>SOLUTION: An incident side slit is provided between an X-ray source and the sample, and an emission side slit is provided between the sample and an X-ray detector. The X-rays regenerated from the sample when the sample is irradiated with the X-rays through the incident side slit are detected by the X-ray detector through the emission side slit. The analysis method is the method for calculating a measured value from the detected value. In the analysis method, a true value is calculated from the measured value using the slit function which expresses the influence of the incident side slit and the emission side slit on the detected value. The slit function can be determined on the basis of the intensity distribution of the X-rays re-diverging from the sample. <P>COPYRIGHT: (C)2004,JPO</p> |
