MASK FOR TRANSFERRING PATTERN AND METHOD FOR JUDGING DEFACE ON MASK FOR TRANSFERRING PATTERN

摘要

PROBLEM TO BE SOLVED: To take neccessary countermeasures in a pattern transferring with use of a mask by detecting variations in beam current resulting from deface and local breakage of the mask to be able to change areas for use of a main opening or replacing the mask in early stages.

SOLUTION: A dedicated opening (sub-openings 6A and 6B) for checking deface of the mask are provided separately from an opening (a main opening 5A) for performing a primary masking on a mask 5 for transferring patterns. A degree in deface of the main opening 5A is presumed by monitoring electron beam 6C passing through the sub-opening with a current measuring instrument 10 to determine if the main opening can perform the pattern transferring with sufficient accuracy.

COPYRIGHT: (C)2004,JPO