发明名称 COMPOUND SEMICONDUCTOR AND ITS MANUFACTURING METHOD AND SEMICONDUCTOR LIGHT-EMITTING DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To add p-type impurities having a desired concentration to a semiconductor layer composed of AlGaInP and a semiconductor layer composed of AlGaAs so that a high-output operation is enabled in a semiconductor light-emitting device using the semiconductor layer composed of AlGaAs and the semiconductor layer composed of AlGaInP. <P>SOLUTION: An n-type clad layer 12, an active layer 13, a first p-type clad layer 14, an etching stop layer 15, a second p-type clad layer 16, a first contact layer 17, a current block layer 19 and a second contact layer 20 are laminated successively on a substrate 11. Mg is added to the first p-type clad layer 14 composed of AlGaInP, the etching stop layer 15, the second p-type clad layer 16 and the first contact layer 17. Zn is added to the second contact layer 20 composed of GaAs as the p-type impurities. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004022630(A) 申请公布日期 2004.01.22
申请号 JP20020172336 申请日期 2002.06.13
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ONISHI SHUNICHI
分类号 H01L21/203;H01L21/205;H01L33/14;H01L33/20;H01L33/30;H01S5/20;H01S5/227;H01S5/30;H01S5/323;H01S5/343 主分类号 H01L21/203
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