ANTIREFLECTIVE SILICON-CONTAINING COMPOSITIONS AS HARDMASK LAYER
摘要
Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
申请公布号
WO2004007192(A1)
申请公布日期
2004.01.22
申请号
WO2002US22176
申请日期
2002.07.11
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
ANGELOPOULOS, MARIE;ARIRAM, ARI;GUARNIERI, C., RICHARD;HUANG, WU-SONG;KWONG, RANEE;MOREAU, WAYNE, M.