发明名称 |
THERMAL PROCESSING APPARATUS AND METHOD FOR EVACUATING A PROCESS CHAMBER |
摘要 |
<p>A thermal processing apparatus (100) is provided comprising a process chamber (102) and a vacuum system (104) for evacuating the process chamber. The vacuum system comprises a pump unit (124) in flow communication with the chamber and a valve assembly (126) between the pump unit and the chamber for controlling a mass flow from the chamber to the pump unit. The valve assembly comprises a main vacuum valve (130) and one or more by-pass valves (132). The one or more by-pass valves are connected to a vacuum line (128) via by-pass lines (133) and in parallel flow in relation with the main vacuum valve.</p> |
申请公布号 |
WO2004007800(A1) |
申请公布日期 |
2004.01.22 |
申请号 |
WO2003US21644 |
申请日期 |
2003.07.10 |
申请人 |
ASML US, INC.;QIU, TAIQUING |
发明人 |
QIU, TAIQUING |
分类号 |
H01L21/22;C23C16/44;C23C16/455;C23C16/46;C23C16/54;F27B5/14;F27B5/18;F27D11/02;H01L21/00;H01L21/02;H01L21/205;H01L21/324;H01L21/677;H05B3/00;H05B3/06;H05B3/66;(IPC1-7):C23F1/00;G03F9/00 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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