发明名称 THERMAL PROCESSING APPARATUS AND METHOD FOR EVACUATING A PROCESS CHAMBER
摘要 <p>A thermal processing apparatus (100) is provided comprising a process chamber (102) and a vacuum system (104) for evacuating the process chamber. The vacuum system comprises a pump unit (124) in flow communication with the chamber and a valve assembly (126) between the pump unit and the chamber for controlling a mass flow from the chamber to the pump unit. The valve assembly comprises a main vacuum valve (130) and one or more by-pass valves (132). The one or more by-pass valves are connected to a vacuum line (128) via by-pass lines (133) and in parallel flow in relation with the main vacuum valve.</p>
申请公布号 WO2004007800(A1) 申请公布日期 2004.01.22
申请号 WO2003US21644 申请日期 2003.07.10
申请人 ASML US, INC.;QIU, TAIQUING 发明人 QIU, TAIQUING
分类号 H01L21/22;C23C16/44;C23C16/455;C23C16/46;C23C16/54;F27B5/14;F27B5/18;F27D11/02;H01L21/00;H01L21/02;H01L21/205;H01L21/324;H01L21/677;H05B3/00;H05B3/06;H05B3/66;(IPC1-7):C23F1/00;G03F9/00 主分类号 H01L21/22
代理机构 代理人
主权项
地址