发明名称 APPARATUS AND METHOD OF MANUFACTURING SILICON
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing apparatus and method in which a product stuck on a structure in a reaction furnace is easily taken out by treating the inside wall or the like of the furnace with a release material prepared by treating high purity silicon carbide powder, high purity silicon nitride powder, high purity silica or the like with a binder, in the apparatus for manufacturing high purity silicon by a vapor phase zinc reducing method. SOLUTION: When high purity silicon is used for the structure in the reaction furnace and high purity silicon stuck on the structure is taken out as it is, the release material is applied on the inside wall of the furnace, so that a quality of the product is improved, the operation is simplified, the production time is shortened and the production cost is reduced . COPYRIGHT: (C)2004,JPO
申请公布号 JP2004018369(A) 申请公布日期 2004.01.22
申请号 JP20020213116 申请日期 2002.06.19
申请人 KAMAIKE YUTAKA;YAMASE HIDEO 发明人 YAMASE HIDEO;KAMAIKE YUTAKA
分类号 C01B33/033;(IPC1-7):C01B33/033 主分类号 C01B33/033
代理机构 代理人
主权项
地址