| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing body which is capable of improving "the flatness of local pattern" by improving a step elimination property while assuring "global removal uniformity" and furthermore has a long service life. <P>SOLUTION: The polishing body 4 is fitted to a base 5. The polishing body 4 has a structure composed of a polishing pad 6, a hard elastic member 7, and a soft member 8 which are stacked in this sequence from a polishing surface. For example, a stainless steel plate is used as the hard elastic member 7. The polishing pad 6 is formed with a groove 6a cut in the polishing surface. Provided that the thickness of a part of the polishing pad 6 where the groove 6a is formed is represented by d, d is so set as to satisfy a formula, 0mm<d≤0.6mm. <P>COPYRIGHT: (C)2004,JPO |
