发明名称 |
NONVOLATILE MEMORY AND ITS MANUFACTURING METHOD |
摘要 |
<p>A nonvolatile memory comprising first and second electrodes (11, 12) and a phase-change recording body (14) interposed between the first and second electrodes (11, 12) and having a resistance variable when an electric pulse is applied between the first and second electrodes (11, 12), wherein at least one of the first and second electrodes (11, 12) contains as a major component at least one kind of ruthenium, rhodium, and osmium, and the phase-change recording body (14) is made of a phase-change material containing a chalcogen element. The nonvolatile memory is free of characteristic degradation (namely, mutual diffusion of impurities between the electrodes and phase-change recording body) due to current application, thus enhancing the durability and reliability.</p> |
申请公布号 |
WO2004008535(A1) |
申请公布日期 |
2004.01.22 |
申请号 |
WO2003JP08349 |
申请日期 |
2003.07.01 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;MORIMOTO, KIYOSHI;TANAKA, HIDEYUKI;OHTSUKA, TAKASHI;MIYAMOTO, AKIHITO |
发明人 |
MORIMOTO, KIYOSHI;TANAKA, HIDEYUKI;OHTSUKA, TAKASHI;MIYAMOTO, AKIHITO |
分类号 |
G11C16/02;H01L27/08;H01L45/00;(IPC1-7):H01L27/10;G11C13/00 |
主分类号 |
G11C16/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|