发明名称 NONVOLATILE MEMORY AND ITS MANUFACTURING METHOD
摘要 <p>A nonvolatile memory comprising first and second electrodes (11, 12) and a phase-change recording body (14) interposed between the first and second electrodes (11, 12) and having a resistance variable when an electric pulse is applied between the first and second electrodes (11, 12), wherein at least one of the first and second electrodes (11, 12) contains as a major component at least one kind of ruthenium, rhodium, and osmium, and the phase-change recording body (14) is made of a phase-change material containing a chalcogen element. The nonvolatile memory is free of characteristic degradation (namely, mutual diffusion of impurities between the electrodes and phase-change recording body) due to current application, thus enhancing the durability and reliability.</p>
申请公布号 WO2004008535(A1) 申请公布日期 2004.01.22
申请号 WO2003JP08349 申请日期 2003.07.01
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;MORIMOTO, KIYOSHI;TANAKA, HIDEYUKI;OHTSUKA, TAKASHI;MIYAMOTO, AKIHITO 发明人 MORIMOTO, KIYOSHI;TANAKA, HIDEYUKI;OHTSUKA, TAKASHI;MIYAMOTO, AKIHITO
分类号 G11C16/02;H01L27/08;H01L45/00;(IPC1-7):H01L27/10;G11C13/00 主分类号 G11C16/02
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