FILM THICKNESS MEASURING METHOD AND APPARATUS THEREFOR

摘要

PROBLEM TO BE SOLVED: To make accurately measurable even an opaque film in a wet state which cannot be measured by a method using a level difference measurement, interference of light, etc. SOLUTION: The film thickness measuring apparatus for measuring the thickness of a wet film M formed by coating the surface of a planar substrate S with a film material in a wet state is provided with a stage 1 for mounting the planar substrate, and setting the wet film upward; a fixing means for vacuum-sucking the substrate; a laser displacement gauge 16 arranged facing the stage; and an eradication means for wiping away the wet film M formed on the surface of the substrate. A first displacement amount to a wet film surface and a second displacement amount to the substrate surface after the wet film is wiped away are measured with the displacement gauge 16. A difference between the first displacement amount and the second displacement amount is assumed to be the thickness of the wet film. COPYRIGHT: (C)2004,JPO