发明名称 |
VARIABLE HEATER ELEMENT FOR LOW TO HIGH TEMPERATURE RANGES |
摘要 |
<p>A method and apparatus for insulating and controlling temperature in a semiconductor manufacturing environment. The invention comprises at least one modular heater element designed to be mounted about a semiconductor furnace process chamber in order to minimize thermal transfer between the furnace interior and exterior. A base ring or cylinder (200, 500, 700) also referred to as a heater ring is sized to be fitted around an inner skin of a semiconductor mini-batch furnace. The base ring (200, 500, 700) has multiple channels (220, 520) equidistantly spaced about its inner perimeter. Heating coils of a type well known in the art may nest in these channels in order to warm the furnace interior. The coils may be either removably or permanently affixed within the channels.</p> |
申请公布号 |
WO2004008054(A1) |
申请公布日期 |
2004.01.22 |
申请号 |
WO2003US21648 |
申请日期 |
2003.07.10 |
申请人 |
ASML US, INC.;QIU, TAIQUING |
发明人 |
QIU, TAIQUING |
分类号 |
H01L21/22;C23C16/44;C23C16/455;C23C16/46;C23C16/54;F27B5/14;F27B5/18;F27D11/02;H01L21/00;H01L21/02;H01L21/205;H01L21/324;H01L21/677;H05B3/00;H05B3/06;H05B3/66;(IPC1-7):F26B3/30 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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