发明名称 Method for reducing the oxygen and oxide content in cobalt to produce cobalt sputtering targets
摘要 The present invention relates to producing cobalt having a low oxygen and a low oxide inclusion content for use as a sputter target thereby reducing the arcing and metal defects during sputtering commonly associated with high-oxygen cobalt sputter targets. Notably, the method for reducing the oxygen content and the oxide inclusion content in cobalt are separate processes which may be combined in successive order to procuce a low-oxygen cobalt sputter target having a low oxide inclusion content. The reduction in oxygen content preferably is performed prior to reducing the oxide inclusion content. Accordingly, the artisan will appreciate that one process can be performed without the other depending upon whether a reduction in oxygen or oxide inclusions is preferred in a desired cobalt sputter target.
申请公布号 US2004011442(A1) 申请公布日期 2004.01.22
申请号 US20030343286 申请日期 2003.01.29
申请人 ZHANG HAO 发明人 ZHANG HAO
分类号 C22C1/02;C23C14/34;(IPC1-7):C22F1/10 主分类号 C22C1/02
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