发明名称 |
Light reflective structure, method for producing the same and display |
摘要 |
In order to fabricate a light reflective structure for a liquid crystal display, a photosensitive resin layer is formed with use of a thermosetting photosensitive resin, the photosensitive resin layer is exposed through a photomask having a particular pattern by a proximity method, the exposed photosensitive resin layer is developed to form an insolubilized resin layer, and the insolubilized resin layer is subjected to a heat treatment to have surface smoothness improved and to accelerate setting of the resin layer. |
申请公布号 |
US2004012966(A1) |
申请公布日期 |
2004.01.22 |
申请号 |
US20030438206 |
申请日期 |
2003.05.15 |
申请人 |
OPTREX CORPORATION, TOKYO, JAPAN |
发明人 |
TAKASAKI ICHIRO;OZEKI MASAO;MORI HARUKI;FUKUOKA KENICHI;OKUDA TAKAHIRO |
分类号 |
G02F1/1335;(IPC1-7):F21V7/00 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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