COMPOSITION FOR ANTIREFLECTION FILM FORMATION

摘要

A composition for antireflection film formation which comprises a urea compound substituted by hydroxyalkyl or alkoxyalkyl and preferably contains a light-absorbing compound and/or light-absorbing resin; a method of forming an antireflection film for a semiconductor device, which comprises using the composition; and a process for producing a semiconductor device, which comprises using the composition. The composition satisfactorily absorbs light having wavelengths for use in semiconductor device production. The composition is hence highly effective in eliminating reflected light. It further has a higher dry-etching rate than photoresist layers.