ETCHING DEVICE AND TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide an etching method by which a unexpected side effects can be reduced when feedback controlling and a control model be constructed without requiring much manpower or time. SOLUTION: The etching device is used to etch a single film 113 through a plurality of etching steps with different recipes. A preset recipe is applied to a final etching step (step 5), where to a lower layer film contact is affected by the film 113, and a recipe-generating means is provided to generate a recipe to be applied to the other etching steps (step 4) on the basis of a treatment result. The etching treatment is applied, based on the recipe generated by the recipe generation means. COPYRIGHT: (C)2004,JPO