发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which is provided with a resistor element capable of reducing a variation in resistivity with a temperature. SOLUTION: The resistor element is formed of a polycystalline SiGe thin film in which the content of Ge atoms is 20-50% and an impurity is doped so that resistivity is 3×10<SP>-2</SP>to 3×10<SP>-1</SP>Ωcm. In a resistivity range lower than 3×10<SP>-1</SP>Ωcm, since the temperature coefficient of resistivity (TCR) is smaller in the polycrystalline SiGe (Ge:20%) than that in polycrystalline Si, a variation in resistivity with a temperature is reduced. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004023016(A) 申请公布日期 2004.01.22
申请号 JP20020179406 申请日期 2002.06.20
申请人 RICOH CO LTD 发明人 WATANABE HIROBUMI
分类号 H01L27/04;H01L21/822;H01L21/8234;H01L27/06;H01L27/088;(IPC1-7):H01L21/822;H01L21/823 主分类号 H01L27/04
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