| 摘要 |
PROBLEM TO BE SOLVED: To provide a high-frequency power supply arrangement for a film deposition system with which a high-frequency power can securely be supplied to a plurality of chambers by using a power device of small capacity. SOLUTION: This high-frequency power supply arrangement is provided with: counterpart chambers 10<SB>1</SB>to 10<SB>n</SB>arranged on a rotary disk 1; a high-frequency power source 33 for feeding high-frequency electric power to the counterpart chambers 10<SB>1</SB>to 10<SB>n</SB>; position detecting parts 38<SB>1</SB>to 38<SB>n</SB>, and 37<SB>1</SB>to 37<SB>n</SB>for detecting the arrival of the rotating counterpart chambers 10<SB>1</SB>to 10<SB>n</SB>placed on the rotary disk 1 at prescribed positions, and a controller 31 wherein, after the supply of high-frequency power from the high-frequency power source 33 to the counterpart chambers 10<SB>1</SB>to 10<SB>n</SB>detected by the position detecting parts 38<SB>1</SB>to 38<SB>n</SB>, and 37<SB>1</SB>to 37<SB>n</SB>, a switchover is performed so that high-frequency power is supplied to the counterpart chambers 10<SB>1</SB>to 10<SB>n</SB>at the subsequent positions connected to the high frequency power source 33. COPYRIGHT: (C)2004,JPO
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