发明名称 COATING LIQUID FOR FORMING INSULATION FILM, AND SEMICONDUCTOR DEVICE BY USING THE SAME
摘要 PROBLEM TO BE SOLVED: To improve a signal transmission performance of a circuit by uniformizing the dielectric constant distribution of an insulation film. SOLUTION: This coating liquid for a film preferably used for a semiconductor device comprises silica obtained by hydrolyzing an alkoxysilane, and contains first fine particles having≤1,000Åmean particle diameter and≤20 % 3σof the particle diameter of the mean particle diameter of the first fine particles, and second fine particles having≤1/3 mean particle diameter of the first fine particles and≤20 % 3σof the particle diameter of the mean particle diameter of the second fine particles. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004018778(A) 申请公布日期 2004.01.22
申请号 JP20020178747 申请日期 2002.06.19
申请人 FUJITSU LTD 发明人 NAMIKI TAKAHISA;NAKADA YOSHIHIRO;SUZUKI KATSUMI;SUGIURA IWAO;OZAWA YOSHIKAZU
分类号 C08G77/04;C09D1/00;C09D5/25;C09D183/00;H01L21/316;H01L21/3205;H01L21/768;H01L23/52;(IPC1-7):C09D1/00;H01L21/320 主分类号 C08G77/04
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