| 摘要 |
PROBLEM TO BE SOLVED: To provide an effective insulation treatment process (manufacturing method of a metal barrier for a picture display device) of a metal barrier for a picture display device having high performance (high precision/high luminosity) since an aperture rate is high, and having high insulation reliability and low cost. SOLUTION: In the manufacturing method of the metal barrier for the picture display device to form an oxide layer which has as the main component at least one kind of SiO<SB>2</SB>, Al<SB>2</SB>O<SB>3</SB>, MgO, ZrO<SB>2</SB>, TiO<SB>2</SB>, SiO<SB>2</SB>-P<SB>2</SB>O<SB>5</SB>series, SiO<SB>2</SB>-Li<SB>2</SB>O series, or P<SB>2</SB>O<SB>5</SB>-Al<SB>2</SB>O<SB>3</SB>series in a substrate for the metal partition wall having numerous through holes, formation of the oxide layer is made by the manufacturing method of the metal barrier for the picture display device formed by a liquid phase deposition method. COPYRIGHT: (C)2004,JPO
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