| 发明名称 |
CONTINUOUS CHEMICAL VAPOR DEPOSITION PROCESS AND PROCESS FURNACE |
| 摘要 |
An apparatus and process is provided for continuously depositing solid carbo n at atmospheric pressure onto the surfaces and in the porosity of a thin substrate material.
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| 申请公布号 |
CA2492597(A1) |
申请公布日期 |
2004.01.22 |
| 申请号 |
CA20032492597 |
申请日期 |
2003.07.17 |
| 申请人 |
HITCO CARBON COMPOSITES, INC. |
发明人 |
PRUETT, JAMES GARY;AWASTHI, SHRIKANT |
| 分类号 |
C23C16/26;C23C16/44;C23C16/455;C23C16/46;C23C16/54;(IPC1-7):C23C16/00;B32B1/00;B32B3/02 |
主分类号 |
C23C16/26 |
| 代理机构 |
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