| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an alternate phase inversion mask for reducing manufacturing process time. <P>SOLUTION: After a 180°phase inverted region is formed, a 0°phase region is formed. As a result, in a multiple step etching for forming the 180°phase inverted region, a number of times of multiple photolithography processes for shielding the 0°phase region is eliminated, thus greatly reducing the manufacturing process time. <P>COPYRIGHT: (C)2004,JPO</p> |
